Description: Polycrystalline diamond micro-powder is synthesized by a special directional detonation method. Compared with a single crystal diamond, there are more crystal edges and grinding surfaces, so it has a high removal rate. With self-sharpening and initial stability
Application: Surface polishing of various ceramics and high-end semiconductor materials, grinding and polishing of semiconductor wafers, SiC, and sapphire wafers;
Available sizes:3-7nm to 7/14μm
Classification::BRM-PD 0-1、BRM-PD 0-2、BRM-PD 1-3~BRM-PD 6-12
Product Catalog: Polycrystalline diamond powder.pdf